Electron beam lithography is a precise technique used to create intricate patterns on surfaces, often for semiconductor manufacturing. It employs a focused beam of electrons to expose a special material called a resist, which changes its properties when hit by the electrons. This allows for the creation of very small features, essential for modern electronics. After exposure, the resist is developed, revealing the desired pattern. The process can be used to fabricate components like microchips and nanostructures. Although slower than other methods, its high resolution makes it invaluable for research and advanced applications in nanotechnology.