Nanoimprint Lithography is a technique used to create nanoscale patterns on surfaces. It involves pressing a mold with a specific design onto a material, typically a polymer, to transfer the pattern. This method is known for its high resolution and ability to produce complex structures, making it valuable in fields like electronics and biotechnology. The process is cost-effective compared to traditional photolithography, as it does not require expensive light sources or masks. Nanoimprint Lithography can be used to fabricate components for semiconductors, solar cells, and microfluidic devices, enabling advancements in various technological applications.