Wet etching is a chemical process used in microfabrication to remove layers from the surface of a material, typically silicon or glass. This technique involves applying a liquid etchant that reacts with the material, dissolving it in specific areas to create desired patterns or features. Wet etching is commonly used in the production of semiconductor devices and integrated circuits. The process is often contrasted with dry etching, which uses gases instead of liquids. Wet etching can provide smoother surfaces and is generally easier to control, making it suitable for applications in the fields of microelectronics and nanotechnology.