Chemical Vapor Deposition (CVD) is a process used to create thin films or coatings on surfaces. In this technique, gaseous reactants are introduced into a reaction chamber, where they undergo chemical reactions to form solid materials that deposit onto a substrate. This method is widely used in industries such as electronics and materials science to produce high-quality films for semiconductors and solar cells. CVD can be performed at various temperatures and pressures, allowing for the deposition of different materials, including metals, oxides, and nitrides. The versatility of CVD makes it an essential tool in the production of advanced materials for applications like microelectronics and nanotechnology.