Thin film deposition is a process used to create very thin layers of material, often just a few nanometers thick, on a substrate. This technique is essential in various industries, including electronics, optics, and materials science, as it allows for the precise control of material properties and functions. Common methods include chemical vapor deposition (CVD) and physical vapor deposition (PVD). These thin films can serve multiple purposes, such as enhancing the performance of solar cells, improving the durability of coatings, or enabling the miniaturization of electronic components. The ability to manipulate the thickness and composition of these films is crucial for developing advanced technologies.