Chemical vapor deposition (CVD) is a process used to create thin films or coatings on surfaces. In this method, gaseous reactants are introduced into a chamber where they react and deposit solid material onto a substrate. This technique is widely used in industries like electronics and optics to produce materials such as silicon for semiconductors and diamond for cutting tools. CVD offers several advantages, including uniform coating and the ability to cover complex shapes. The process can be precisely controlled by adjusting temperature and pressure, allowing for the creation of high-quality films with specific properties. This makes CVD essential in manufacturing advanced materials for various applications.