Plasma etching is a process used in semiconductor manufacturing to remove layers from the surface of a material. It involves creating a plasma, which is a state of matter made up of ionized gas, and directing it onto the material. The reactive ions in the plasma interact with the surface, effectively etching away specific areas to create desired patterns. This technique is essential for producing intricate designs on silicon wafers and other substrates used in electronic devices. By controlling the plasma's composition and energy, manufacturers can achieve precise etching, which is crucial for the performance of microchips and other components.