Ion implantation is a process used in semiconductor manufacturing to introduce specific ions into a material, typically silicon. This technique alters the electrical properties of the material, allowing it to function as a semiconductor. Ions are accelerated and directed into the substrate, where they penetrate and become embedded. The process is highly controlled, enabling precise placement and concentration of ions. This precision is crucial for creating components like transistors and diodes in integrated circuits. By adjusting the energy and dose of the ions, manufacturers can tailor the material's characteristics to meet specific performance requirements.