Chemical Vapor Deposition (CVD) is a process used to produce thin films and coatings on various surfaces. In this technique, gaseous reactants are introduced into a reaction chamber, where they undergo chemical reactions to form solid materials that deposit onto a substrate. This method is widely used in industries such as electronics, optics, and materials science. CVD can create high-quality films with precise control over thickness and composition. It is essential for manufacturing components like semiconductors, solar cells, and protective coatings. The versatility of CVD allows for the deposition of a variety of materials, including metals, oxides, and nitrides.