Metallic interconnects are conductive pathways made from metals, typically used in electronic devices to connect different components. They facilitate the flow of electrical signals and power between parts, such as transistors, capacitors, and resistors. Common materials for these interconnects include copper and aluminum, chosen for their excellent conductivity and reliability. In modern electronics, the design and fabrication of metallic interconnects are crucial for performance and efficiency. As devices become smaller and more complex, the challenge is to create interconnects that minimize resistance and signal loss while fitting within tight spaces. This is particularly important in advanced technologies like integrated circuits and microprocessors.