Extreme ultraviolet (EUV) refers to a specific range of ultraviolet light with wavelengths between 10 and 121 nanometers. This type of radiation is shorter than traditional ultraviolet light and is primarily used in advanced technologies, such as semiconductor manufacturing. EUV lithography enables the production of smaller and more efficient microchips by allowing for finer patterning on silicon wafers. EUV is generated using specialized light sources, often involving the use of lasers to create plasma. This technology is crucial for the development of modern electronics, as it helps meet the increasing demand for faster and more powerful devices, including smartphones and computers.