NF₃, or nitrogen trifluoride, is a chemical compound composed of one nitrogen atom and three fluorine atoms. It is a colorless gas at room temperature and has a slightly sweet odor. NF₃ is primarily used in the electronics industry for the production of semiconductors and as a cleaning agent in plasma etching processes. This compound is notable for its greenhouse gas properties, having a global warming potential significantly higher than carbon dioxide. NF₃ is stable in the atmosphere, which means it can persist for a long time, raising concerns about its environmental impact and prompting discussions about regulation and alternatives in industries that utilize it.