Mask Alignment is a technique used in various fields, particularly in semiconductor manufacturing and photolithography. It involves precisely positioning a mask, which contains patterns for circuit designs, over a substrate. This alignment is crucial to ensure that the patterns are accurately transferred onto the material, allowing for the creation of intricate electronic components. The process typically uses alignment marks on both the mask and the substrate to achieve high precision. By utilizing optical systems, operators can adjust the position of the mask until it perfectly matches the desired location. Accurate Mask Alignment is essential for producing reliable and efficient electronic devices.